Description: TEA Systems software for semiconductor process and tool modeling and control using adaptive models.
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Semiconductor data modeling for reticle, tool, process and yield AntiSpam About TEA | Introducing TEA (Presentations) | Services | Publications | Classes | Contact [ Products ] [ News ] [ Product Overviews ] [ Brochures ] Video Tutorials: Vector Raptor / Best Focus Free Analysis Request IC Photomask c1974 Emulsion on 8 x 10 x 0.25 inch Glass Plate
Double-Pattern Vector Rotation/Magnification, BARC and Feature-Profile Uniformity Comparative & Difference Matching Tools ..... VR Matching tm A new and unique concept in data analysis for Overlay, Focus, CD, Film Thickness etc. with a simplified approach to Performance Matching, Process Window Extrapolation, Tool Matching, Reticle Haze detection, DFM Validation and Yield Enhancement TEA Systems
Semiconductor Process Characterization and Control Software