公益社団法人 日本表面真空学会
Description: ISSP has been historically held biennially since 1991. It will continue in 2024 to promote discussions and information exchange across the academic and industrial researchers in the field of sputter deposited thin films and related plasma processes, in the traditional city KYOTO, Japan.
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The Conference Four Days of Powerful Talks 02 -05 July 2024 International Symposium on Sputtering and Plasma Processes (ISSP) was established in 1991. The 1st symposium was held in Tokyo, and the main subject was “Reactive Sputtering”. It was the time, some new approaches to improve deposition rate and stability of the reactive sputtering process were started to be addressed. Since then, the symposium has been held biennially. At each symposium, the current topics and trends concerning sputtering and plasma
公益社団法人 日本表面真空学会